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Vacuum Melting Electronic Grade Copper SiC Graphite Crucible for Semiconductor Target Material
Productdetails:
| Plaats van herkomst: | China |
| Merknaam: | Baidun |
| Modelnummer: | VM-EG400 |
Betalen & Verzenden Algemene voorwaarden:
| Min. bestelaantal: | 1 STUKS |
|---|---|
| Prijs: | Negotiate |
| Verpakking Details: | Exporteer houten verpakking |
| Levertijd: | 25-30 dagen |
| Betalingscondities: | T/T |
| Levering vermogen: | 2000 stuks/maand |
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Gedetailleerde informatie |
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| Materiaal: | Siliciumcarbide en grafiet | Dikte: | 2.21-2.25 g/cm3 |
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| Vorm: | Cilindrisch | Temperatuurbestendigheid: | Tot 1650°C |
| Proces: | Vacuüm smelten | Sollicitatie: | Koper van elektronische kwaliteit voor halfgeleiderdoelen |
| Zuiverheid: | 6N (99,9999%) | Sfeer: | Hoog vacuüm |
| Markeren: | electronic grade copper melting crucible,SiC graphite crucible for semiconductors,vacuum melting crucible for target material |
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Productomschrijving
Vacuum Melting Electronic Grade Copper SiC Graphite Crucible
Ultra-high purity crucible for vacuum melting of 6N (99.9999%) electronic grade copper used in semiconductor sputtering targets. Minimal outgassing and zero contamination design.
Key Features
- Vacuum compatible ultra-low outgassing
- 6N purity retention capability
- Semiconductor grade material quality
- Clean melting for target manufacturing
- Batch traceability documentation
Applications
Semiconductor sputtering target production, electronic grade copper melting, high-purity copper for chip manufacturing, PVD target material preparation.
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